40nm BSI CMOS Image SensorFree after sign-in

Lower OCL Etch

390/ 417

Optical Pad 2 Etch

Optical Pad 1 Etch
382Bond Pad Opening 1 - Photo383Upper OCL Coating Etch384Ashing & Strip/Clean385Bond Pad Opening 2 - Photo386Upper Grid Seal Layer Etch387Optical Pad 3 Etch388Lower OCL Coating Etch389Lower OCL Etch390Optical Pad 2 Etch391Optical Pad 1 Etch392Oxide Grid Seal Layer Etch393BPMD Etch394HKD/AR2 Etch395HKD/AR1 Etch396RIE etch, Si Back etch397Ashing & Strip/Clean398Bond Pad Opening 3 - Photo399Si Etch400Pad Oxide Etch401CESL 1 Etch402CESL 2 Etch403PMD 1 Etch404PMD 2 Etch405PMD 3 Etch406PMD 4 Etch407PMD 5 Etch408RIE etch ILD 1-1 Etch409RIE etch ILD 1-2 Etch410RIE etch ILD 2-1 Etch411RIE etch ILD 2-2 Etch412RIE etch ILD 3-1 Etch413RIE etch ILD 3-2 Etch414Bond Pad Metal 7 Barrier Etch415Ashing & Strip/Clean

Process Cross-Section

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Step highlight

the fluorocarbon precursors form a carbon-rich polymer layer on the sidewalls, which passivates the surface and minimizes lateral etching, thereby ensuring a highly anisotropic profile [P1].

In depth

In a 40nm BSI CMOS Image Sensor, opening the backside bond pad requires penetrating a complex stack of optica…

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Related steps

  • Bond Pad Cavity - Photo
  • ILD 6-2 Oxide Etch
  • ILD 6-1 SiCN Etch
  • ILD 5-2 Oxide Etch
  • ILD 5-1 SiCN Etch
  • ILD 4-2 Oxide Etch