Following the deposition of the Upper OCL protective oxide, this pre-litho cleaning step prepares the topographical surface of the microlens array for the subsequent Bond Pad Opening photoresist coating A2.Unlike earlier planar pre-litho cleans in the process flow (e (Engineering Practice).g., steps #7, #13, #27), this specific operation must address the severe microscopic topography created by the underlying reflowed microlenses (Engineering Practice).The primary objective is to remove any part