Blanket B Well Implant - 40nm | SemiFlows

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Blanket B Well Implant

25SiN Hard Mask Deposition 26SiO Hard Mask Deposition 27Pre Litho Cleaning 28Shallow Trench Isolation - Photo 29Oxide Etch 30Nitride Etch 31Si Etch 32Ashing & Strip/Clean 33Trench Sidewall Passivation 34STI Liner Oxidation 35STI Fill Conformal CVD Liner 36STI Fill Liner Etchback 37Oxidation Preaclean 38STI Fill Conformal CVD Oxide 39STI Fill Post Clean 40STI Conformal CVD Anneal 41Pre-CMP Oxide Deposition 42STI CMP 43STI CMP Post Cleaning 44STI Final Densification Anneal 45Wet Deglaze Etch 46SiN Strip 47Blanket B Well Implant

Process Cross-Section

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Step highlight

The Blanket Boron (B) Well Implant is executed immediately following the removal of the STI silicon nitride mask to establish the baseline p-type conductivity across the semiconductor substrate [A2].

In depth

The Blanket Boron (B) Well Implant is executed immediately following the removal of the STI silicon …

Related steps

SiN Hard Mask Deposition
SiO Hard Mask Deposition
Pre Litho Cleaning
Shallow Trench Isolation - Photo
Oxide Etch
Nitride Etch