SiO Hard Mask Deposition - 40nm | SemiFlows

40nm BSI CMOS Image SensorFree after sign-in

26/ 417

SiO Hard Mask Deposition

25SiN Hard Mask Deposition 26SiO Hard Mask Deposition 27Pre Litho Cleaning 28Shallow Trench Isolation - Photo 29Oxide Etch 30Nitride Etch 31Si Etch 32Ashing & Strip/Clean 33Trench Sidewall Passivation 34STI Liner Oxidation 35STI Fill Conformal CVD Liner 36STI Fill Liner Etchback 37Oxidation Preaclean 38STI Fill Conformal CVD Oxide 39STI Fill Post Clean 40STI Conformal CVD Anneal 41Pre-CMP Oxide Deposition 42STI CMP 43STI CMP Post Cleaning 44STI Final Densification Anneal 45Wet Deglaze Etch 46SiN Strip 47Blanket B Well Implant

Process Cross-Section

Loading visual…

Step highlight

an optimized oxide surface provides a suitable energy state and chemical termination for the adhesion of subsequent anti-reflective coatings and photoresist layers used in the STI lithography module [P3].

In depth

The SiO Hard Mask Deposition step serves as a critical pattern transfer layer within the Shall…

Related steps

SiN Hard Mask Deposition
Pre Litho Cleaning
Shallow Trench Isolation - Photo
Oxide Etch
Nitride Etch
Si Etch