Nitride Etch - 40nm BSI CMOS Image Sensor 40nm | SemiFlows

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Nitride Etch

25SiN Hard Mask Deposition 26SiO Hard Mask Deposition 27Pre Litho Cleaning 28Shallow Trench Isolation - Photo 29Oxide Etch 30Nitride Etch 31Si Etch 32Ashing & Strip/Clean 33Trench Sidewall Passivation 34STI Liner Oxidation 35STI Fill Conformal CVD Liner 36STI Fill Liner Etchback 37Oxidation Preaclean 38STI Fill Conformal CVD Oxide 39STI Fill Post Clean 40STI Conformal CVD Anneal 41Pre-CMP Oxide Deposition 42STI CMP 43STI CMP Post Cleaning 44STI Final Densification Anneal 45Wet Deglaze Etch 46SiN Strip 47Blanket B Well Implant

Process Cross-Section

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Step highlight

The careful synchronization of vertical ion bombardment and radical adsorption ensures strict anisotropic etching, preventing unwanted lateral undercut beneath the overlying lithographic mask [P1].

In depth

This Nitride Etch step is a critical pattern-transfer operation within the Shallow Trench Isolation (S…

Related steps

SiN Hard Mask Deposition
SiO Hard Mask Deposition
Pre Litho Cleaning
Shallow Trench Isolation - Photo
Oxide Etch
Si Etch