Shallow Trench Isolation - Photo - 40nm | SemiFlows

40nm BSI CMOS Image SensorFree after sign-in

28/ 417

Shallow Trench Isolation - Photo

25SiN Hard Mask Deposition 26SiO Hard Mask Deposition 27Pre Litho Cleaning 28Shallow Trench Isolation - Photo 29Oxide Etch 30Nitride Etch 31Si Etch 32Ashing & Strip/Clean 33Trench Sidewall Passivation 34STI Liner Oxidation 35STI Fill Conformal CVD Liner 36STI Fill Liner Etchback 37Oxidation Preaclean 38STI Fill Conformal CVD Oxide 39STI Fill Post Clean 40STI Conformal CVD Anneal 41Pre-CMP Oxide Deposition 42STI CMP 43STI CMP Post Cleaning 44STI Final Densification Anneal 45Wet Deglaze Etch 46SiN Strip 47Blanket B Well Implant

Process Cross-Section

Loading visual…

Step highlight

For positive resists, light exposure breaks down a chemical stabilizer, increasing the dissolution rate of the exposed regions in a developer solvent [T2].

In depth

The Shallow Trench Isolation (STI) Photo step defines the spatial boundaries of the active areas (AA) and the isolation trenches across the semi…

Related steps

SiN Hard Mask Deposition
SiO Hard Mask Deposition
Pre Litho Cleaning
Oxide Etch
Nitride Etch
Si Etch