Lower OCL Coating Etch (LS_GRID) - 40nm

The use of an etch stop layer or precise end-point detection prevents over-etching into the underlying optical pad [A1].

In the 40nm BSI CMOS Image Sensor flow, the Light Shield (LS) Grid requires precise patterning to prevent optical crosstalk between adjacent pixels (Engineering Practice). Follo…

The use of an etch stop layer or precise end-point detection prevents over-etching into the underlying optical pad [A1].

In the 40nm BSI CMOS Image Sensor flow, the Light Shield (LS) Grid requires precise patterning to prevent optical crosstalk between adjacent pixels (Engineering Practice). Follo…

40nm BSI CMOS Image SensorFree after sign-in

Process Cross-Section

Step highlight

In depth

40nm BSI CMOS Image SensorFree after sign-in

Process Cross-Section

Step highlight

In depth