The Pixel Array P-Well IIP - Photo step is a critical photolithography operation designed to define the spatial boundaries for the subsequent P-well ion implantation within the active image sensor array T2.Positioned after the photocathode formation and before the well implantation, this step exposes specific regions where P-type dopants will be introduced to form the body of pixel transistors and the isolation zones between adjacent photodiodes P2.Unlike the periphery P-well lithography which i