Pixel Array P-Well Implant Mask Lithography - 40nm | SemiFlows

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Pixel Array P-Well Implant Mask Lithography

56Pixel Array P-Well Implant Mask Lithography 57P-Well Ion Implantation 58Ashing & Strip/Clean 59Periphery P-Well Implant Mask Lithography 60P-Well Ion Implantation 61Ashing & Strip/Clean 62Periphery N-Well Contact Implant Mask Lithography 63N-Well Contact Ion Implantation 64Ashing & Strip/Clean

Process Cross-Section

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Step highlight

The photoresist is patterned to block ion implantation in protected areas while allowing dopants to enter exposed silicon regions, forming a defined concentration profile [T2].

In depth

The Pixel Array P-Well IIP - Photo step is a critical photolithography operation designed to define the spatial boundaries …

Related steps

Ox growth
Pre Litho Cleaning
Periphery N-Well Implant Mask Lithography
N-Well Ion Implantation
Ashing & Strip/Clean
P-Well Ion Implantation