Periphery N-Well Contact Implant Mask Lithography - 40nm | SemiFlows

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Periphery N-Well Contact Implant Mask Lithography

56Pixel Array P-Well Implant Mask Lithography 57P-Well Ion Implantation 58Ashing & Strip/Clean 59Periphery P-Well Implant Mask Lithography 60P-Well Ion Implantation 61Ashing & Strip/Clean 62Periphery N-Well Contact Implant Mask Lithography 63N-Well Contact Ion Implantation 64Ashing & Strip/Clean

Process Cross-Section

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Step highlight

The photo step defines surface regions for precise low-resistance ohmic connections by patterning the resist [P2].

In depth

The Periphery N-Well Contact IIP - Photo step is a critical lithographic operation designed to define the localized regions for heavily doped surface implants within the pre-existing N-…

Related steps

Ox growth
Pre Litho Cleaning
Periphery N-Well Implant Mask Lithography
N-Well Ion Implantation
Ashing & Strip/Clean
Pixel Array P-Well Implant Mask Lithography