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PMD 2 Etch

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PMD 1 Etch

CESL 2 - Etch
112Metal 0 Gate and S/D Contact Opening - Photo113PMD 3 Etch114PMD 2 Etch115PMD 1 Etch116CESL 2 - Etch117CESL 1 - Etch118Pad Oxide Etch119Poly/Si Back Etch120Ashing & Strip/Clean121Ti/TiN Deposition122W Deposition123W CMP124TiN/Ti CMP

Process Cross-Section

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Step highlight

Etching completes the PMD oxide-stack opening while leaving the underlying CESL closed, preventing false identification of electrical contact exposure (Engineering Practice).

In depth

This is checkpoint 3 of 3 for the PMD oxide stack. The underlying CESL has not yet been opened, so an electrical contact su…

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Related steps

  • Metal 0 Gate and S/D Contact Opening - Photo
  • PMD 3 Etch
  • PMD 2 Etch
  • CESL 2 - Etch
  • CESL 1 - Etch
  • Pad Oxide Etch