Metal 0 Gate and S/D Contact Opening - Photo - 40nm | SemiFlows

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Metal 0 Gate and S/D Contact Opening - Photo

112Metal 0 Gate and S/D Contact Opening - Photo 113PMD 3 Etch 114PMD 2 Etch 115PMD 1 Etch 116CESL 2 - Etch 117CESL 1 - Etch 118Pad Oxide Etch 119Poly/Si Back Etch 120Ashing & Strip/Clean 121Ti/TiN Deposition 122W Deposition 123W CMP 124TiN/Ti CMP

Process Cross-Section

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Step highlight

CN0 pattern definition creates resist openings retained for PMD 3, PMD 2, and PMD 1 etch steps, avoiding three separate lithography cycles (Engineering Practice).

In depth

This is the single CN0 pattern-definition step. Its resist openings are retained for the following PMD 3, PMD 2, and PMD 1 etch checkpo…

Related steps

PMD 3 Etch
PMD 2 Etch
PMD 1 Etch
CESL 2 - Etch
CESL 1 - Etch
Pad Oxide Etch