Lower OCL Planar Layer Deposition - 40nm

[P3] Because the underlying grid features are relatively narrow, capillary forces dominate over gravity and viscous resistance, acting as the primary drivers for film flow and topography leveling.

In the 40nm BSI CIS flow, after the W CMP and Optical Pad 2 Deposition steps, the substrate typically e…

[P3] Because the underlying grid features are relatively narrow, capillary forces dominate over gravity and viscous resistance, acting as the primary drivers for film flow and topography leveling.

In the 40nm BSI CIS flow, after the W CMP and Optical Pad 2 Deposition steps, the substrate typically e…

40nm BSI CMOS Image SensorFree after sign-in

Process Cross-Section

Step highlight

In depth

40nm BSI CMOS Image SensorFree after sign-in

Process Cross-Section

Step highlight

In depth