By controlling the electrostatic repulsion between the suspended particles and the W surface—analogous to adjusting the surface $\zeta$ potential in post-CMP cleans—the process ensures that lifted defects do not redeposit [P2].
In the 40nm BSI CMOS Image Sensor BEOL flow, this specific Pre Litho Cle…
Sign in to continue through all 417 steps
Sign Up Free