The Pre Litho Cleaning step in the ILD5 module serves as the critical surface preparation phase immediately preceding Via 5 photolithography (Engineering Practice).Following the dual-layer deposition of ILD 5-1 and ILD 5-2, the wafer surface must be meticulously prepared to receive the anti-reflective coating (ARC) and photoresist layers necessary for subsequent patterning A2.Unlike earlier pre-litho cleaning steps in the FEOL that may interact with bare silicon or active transistor regions T1,