Following the deposition of the PMD 4 layer, the wafer surface typically exhibits complex post-deposition topographic variations that depend heavily on the underlying pattern geometry P3.This Pre Litho Cleaning step acts as the critical bridge between middle-of-line (MOL) dielectric deposition and the subsequent photolithography module for Metal 1 Gate and Source/Drain (S/D) Contact Opening P4.Unlike earlier pre-litho cleans that operate on bare silicon or thin pad oxides, this specific step mus