The P-Pinning IIP - Photo step is a critical lithographic process that defines the implantation mask for the p+ surface layer of the Pinned Photodiode (PPD) P1.Following the formation of the N-type Floating Diffusion (FD), this step precisely patterns a photoresist layer to expose the silicon surface over the photodiode while protecting the transfer gate (TG), FD, and peripheral circuit regions A1.The correct spatial definition of this opening is paramount, as the detailed fabrication process ar