7nm FinFET 7nm Process Step | SemiFlows
7nm FinFET
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eSi Growth
218
/ 714
Locked step
Metal Gate CMP
218
/
714
Locked step
Next step
Overview
Wafer Start
1
1
Starting Wafer
STI
93
2
Pad Oxidation Pre Clean
3
Pad Oxide Growth
4
SiN Hardmask Deposition
5
Transfer Oxide Deposition
93
Fin Recess Etch
Gate
24
117
Etch a-Si Gate
Source/Drain
36
136
eSi Growth
Poly Open Polish
27
RMG
41
221
Metal Gate CMP
+40 steps
Contact
112
305
Gate Contact_E1 Lithography
314
Gate Contact_E2 Lithography
319
Gate Contact Integrated Etch
Via Contact
47
380
Via Contact Metallization CMP
Metal 0
67
Metal 1
90
Metal 2
51
Metal 3
39
Intermediate Metal (M4-M8)
23
Metal 9
19
Metal 10
14
Metal 11
14
Metal 12
16
714
Passivation SiN Deposition
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