The previous lithography steps leave patterned cylindrical or polygonal polymer islands over each pixel (Engineering Practice).The Upper OCL Reflow step is necessary to transform these steep-sided polymer blocks into functional, continuous hemispherical convex lenses P1.This transformation maximizes the light-gathering capability of the pixel by directing incident rays toward the underlying photodiode (Engineering Practice).By transitioning the patterned UOCL into an optimal optical profile, thi