See the complete process flow — every step, and every why
Complete 40nm→7nm flows, rendered step-by-step in 2.5D cross-sections and grounded in papers, patents & textbooks — with an AI you can ask. Every claim cited.
Process flow visualization
4 technology nodes · 40nm→7nm · 2.5D cross-sections
- Step-by-step flow navigation
- 2D cross-section for every step
- Rationale + citation tracing
Sample answer
Why must the high-k layer in HKMG be deposited by ALD?
In HKMG integration, high-k dielectrics such as HfO₂ must be deposited by atomic layer deposition (ALD) rather than CVD/PVD: ALD's self-limiting surface reactions give sub-nanometer thickness control and excellent conformality , critical for EOT scaling and gate-leakage control . Layer-by-layer growth of the interfacial layer and high-k also suppresses oxygen-vacancy defects, reducing threshold-voltage shift .
Atomic Layer Deposition of High-κ Dielectrics
(2018)
EOT Scaling and Gate Leakage in HKMG Stacks
2016
Why SemiFlows over General AI?
General AI is a good tool, but semiconductor processes demand a specialized engine
Curated Corpus + Citation Tracing
Extensive papers + patents + textbooks — every answer tagged with [T1][P2][A3] source IDs, traceable to original text
General AI: general internet corpus, frequently fabricates non-existent references
Mechanism-Aware AI Engine
Automatically infers process type and functional role, with deep mechanism analysis grounded in paper data and patented solutions
General AI: stays at textbook overview level, unaware of relationships between process steps
Complete Process Flow Visualization
Step-by-step navigation of 1,700+-step flows (40nm CIS / 28nm / 14nm / 7nm), plus a 2D process cross-section for each step to watch the material stack take shape (live for 28nm and 14nm, more nodes rolling out)
General AI: text-only output, no process flow visualization
Pricing
Two parallel offerings — mix freely: process-flow nodes (one-time, lifetime) + AI deep Q&A (subscription, free tier included)
Technology Nodes
One-time purchase, lifetime access
28nm
- 266-step complete process flow
- Rationale & risk analysis per step
- Paper & patent citation tracing
- HKMG integration details
- 2D process cross-section for every step — physical structure evolution, step by step
- Includes 300 AI chat credits/month
- One-time purchase, lifetime access
14nm
- 362-step FinFET process flow
- Rationale & risk analysis per step
- Paper & patent citation tracing
- Multi-patterning + MOL integration
- 2D process cross-section for every step — physical structure evolution, step by step
- Includes 300 AI chat credits/month
- One-time purchase, lifetime access
7nm
- 716-step advanced process flow
- Rationale & risk analysis per step
- Paper & patent citation tracing
- SAQP patterning + self-aligned contacts
- Includes 300 AI chat credits/month
- One-time purchase, lifetime access
Pay with card, UPI, or WeChat Pay (desktop)
AI Deep Analysis
Subscribe to AI deep analysis after purchasing any process flow
Free
Try AI process Q&A
- 120 AI chat credits/month
- Quick answer mode
- Basic citation tracing
Owner
Included with any node purchase
- 300 AI chat credits/month
- Quick answer mode
- Basic citation tracing
- Full process flow access
Pro
RecommendedSmart reasoning + deep knowledge retrieval
- 6,000 AI chat credits/month
- Smart reasoning engine (multi-model)
- Full citation tracing (papers/patents/textbooks)
- Deep knowledge retrieval + process context analysis
Requires any node — the free Owner tier comes with any node purchase
All Access Pro
Save vs buying separatelyAll nodes lifetime access + Pro AI for 1 year
Renews at $180/yr (Pro AI only)
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Frequently Asked Questions
Common questions about the SemiFlows platform
SemiFlows is an AI-powered semiconductor process knowledge platform that provides complete, step-by-step process flows from 40nm to 7nm, covering both logic chips and CMOS image sensors. It integrates extensive research papers, patents, and authoritative textbooks to deliver in-depth rationale analysis with citation tracing for each process step. The 40nm BSI CIS flow is entirely free.
SemiFlows currently covers four process flows: 40nm BSI CMOS Image Sensor (417 steps, free), 28nm Planar (266 steps), 14nm FinFET (362 steps), and 7nm FinFET (716 steps). Together, these flows provide over 1,700 detailed process steps spanning both logic chip and image sensor fabrication.
Unlike general AI assistants, SemiFlows is purpose-built for semiconductor process engineering. Every answer is grounded in curated academic papers, patents, and textbooks — not general internet knowledge. The platform provides citation-backed explanations with traceable references, structured process flows, and domain-specific context that general AI tools cannot match.
SemiFlows provides physics and chemistry principles behind each process step, mechanism explanations (why a process works), integration rationale (why steps are ordered a certain way), and risk analysis. All content focuses on fundamental principles — not specific manufacturing recipes, equipment parameters, or vendor details.
Yes. SemiFlows supports both English and Chinese (中文). Users can switch languages at any time using the language toggle. The AI chat assistant also responds in the user's selected language.