28nm Planar Flow

Device Context and Integration Logic

The AA Cap Oxide Deposition step is inserted after the N-free DARC and amorphous carbon stack formation to create an inorganic capping layer that mechanically and chemically stabilizes the underlying organic films during subsequent lithography and etch processing [P1].In the 28 nm planar STI-related AA module, this cap oxide functions as a transition layer that decouples the chemically active carbon-based hardmask from the photoresist and BARC layers th…

• [High] Interfacial Delamination: Poor chemical bonding or contamination at the amorphous carbon/oxide interface can lead to weak adhesion, causing delamination during thermal cycling or plasma exposure, driven by mismatch in surface energy and stress accumulation mechanisms [P3].- [Medium] Carbon Oxidation or Erosion: Excessively aggressive surface reactions during oxide formation can partially oxidize or densify the underlying amorphous carbon, altering its etch behavior and reducing …