AA Cap Oxide Deposition - 28nm Planar Flow 28nm | SemiFlows

28nm Planar FlowPreview

AA N-free DARC Deposition

5/ 266

AA Cap Oxide Deposition

1AA Pad Oxidation 2AA Pad Nitride Deposition 3AA Amorphous Carbon Deposition 4AA N-free DARC Deposition 5AA Cap Oxide Deposition

+2 steps

8AA Etch 15STI Liner Oxidation 18STI HARP Oxide Deposition 21STI CMP

45High-k HfO2 Deposition 54P1 Poly Photo

100SiGe Deposition

107Spacer2 Etch

155Dummy Poly Dry Removal 167MG CMP

187CT Tungsten CMP

218V1M2 Etch 222M2 Copper Electrochemical Plating 224M2 Cu CMP

Process Cross-Section

Loading visual…

Step highlight

AA Cap Oxide Deposition creates a dense inorganic layer that suppresses outgassing from underlying amorphous carbon during thermal processing [P3].

In depth

Device Context and Integration Logic

The AA Cap Oxide Deposition step is inserted after the N-free DARC and amorphous carbon stack formation to create an inorganic capping layer that mechanically and chemically stabilizes the underlying organic films during subsequent lithography and etch processing [P1]. In the 28 nm planar STI-related AA modu…

Read the full explanation and sources for free.

Related steps

AA Pad Oxidation
AA Pad Nitride Deposition
AA Amorphous Carbon Deposition
AA N-free DARC Deposition