Amorphous carbon forms a disordered network of sp² and sp³ bonds, eliminating grain boundaries that would otherwise degrade etch uniformity [P1].
The AA Amorphous Carbon Deposition step is inserted in the STI module after pad oxide, pad nitride, and hardmask formation to introduce a sacrificial yet mechanically robust pattern transfer layer that can decouple lithographic pattern fidelity from aggressive trench etch requirements [A1]. In a planar 28 …
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